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Application Composition Technology Characterization Single Wafer 4 Wafer Batch Gen3 to Gen5
Amorphous Silicon Absorber a-Si:H PECVD Properties RS400 RS9, LS9 RS10, RS11
Micro Crystalline Silicon Absorber -c-Si:H PECVD Properties RS400 RS9, LS9 RS10, RS11
Zincoxid Front Contact B-doped ZnO PECVD Properties RS400 RS9, LS9 RS10, RS11
Zincoxid Buffer Layer i-ZnO PECVD Properties RS400 RS9, LS9 RS10, RS11
Anti-reflective-layer SixNy PECVD Properties RS400 RS9, LS9 RS10, RS11
Barrier Layer Si3N4 PECVD Properties RS400 RS9, LS9 RS10, RS11
Barrier Layer Al203 PECVD Properties RS400 RS9, LS9 RS10, RS11