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COPRA Plasma Sources

The unique feature of the COPRA Plasma Source Technology is the high degree of plasma excitation efficiency in combination with scalability from R&D to any kind of industrial production scale. Process engineers know the crux of the necessity to redesign the hardware in plasma processing whilst moving to a next step of industrial scales. The COPRA Technology breaks through this wall because the basic plasma parameter controlling a process result are not changing by scaling in size and speed as long as the right power level is adjusted. The COPRA Technology is therefore seen as a coming bench mark of industrial plasma standards.
All COPRA sources are inductively coupled low pressure rf plasma sources.
The overall technical specs depending on source type are:
DN250
DN 250CF
DN250
DN250-ISOK

DN400/500
RF-Power 0.1 to 10kW
RF-Matching Integrated ICP - Matchbox
Match Control Remote or Manual
Pressure Range 5E-5 to 1mbar
Gases Any
Cooling Water
Substrate Dimension up to 1300 mm
   
For Specifics Specs please click on the particular COPRA!
LS9
LS9

RS6
RS6

RS9
RS9/10/11
RS400
RS400
IS300
IS300
COPRA Cube
COPRA Cube
Faraday
Faraday Cup