Cleaning Assist PECVD Etching Optics Solar Wear & Decorative R&D

Home

Products COPRA Overview

Basics of the COPRA

Customer Support

Sales

News

History

Contact and Location

Send Enquiry

Disclaimer/Impressum

Evaluation Request

Google+

VCi Blue Chip Rated from www.vacuumcoating.info


COPRA DN250-ISO-K
The COPRA DN 250-ISOK is the most interns COPRA plasma source. Off all COPRA sources the DN250-ISOk has the highest power to plasma volume ratio which leads to plasma densities of more than 1E13 per cm³. The COPRA DN250-ISOK is mainly applied for bench mark controls i.e. to find the limits of deposition rates or etch rates on small scales. Further the COPRA DN250-ISO-K is proven as a assist source in optical coater for precision optics as well as high rate deposition of protective films in storage media like carbon overcoats on hard disks or semi conductors.
Calotte Size up to 800mm
DN250-ISOK
DN250-ISOK
Wafer Size up to 4"
Pressure Range 1E-4 to 2E-2 mbar
RF-Power max. 3000 Watt
Matching Remote or Manual
Ion Energy up to 250 eV
Current Density up to 4 mA/cm2
Extraction grounded W-Grid
Apps
E-Gun Assist
Wafer Processing